Plated terminals with routing interconnections semiconductor device

ABSTRACT

A semiconductor package includes terminals, each having an exposed surface that is flush with a bottom surface of the semiconductor package, and a layer of interconnection routings disposed within the semiconductor package. At least one interconnection routing is electrically coupled with a terminal and extends planarly therefrom. The semiconductor package also includes at least one die coupled with the layer of interconnection routings. In some embodiments, the semiconductor package also includes one or more additional intermediary layers. Each intermediary layer includes a via layer and an associated routing layer. The associated routing layer includes associated routings. At least one associated routing is electrically coupled with a terminal and extends planarly therefrom. Each via layer couples two routing layers. The semiconductor package also includes a locking mechanism for fastening a package compound with the interconnection routings and the terminals.

RELATED APPLICATIONS

This application claims benefit of priority under 35 U.S.C. section119(e) of the co-pending U.S. Provisional. Patent Application Ser. No.61/645,560, filed May 10, 2012, entitled “PLATING TERMINAL AND ROUTINGINTERCONNECTION SEMICONDUCTOR DEVICE,” which is hereby incorporated byreference in its entirety.

FIELD OF THE INVENTION

The present invention is related to the field of semiconductor devices.More specifically, the present invention relates to plated terminalswith routing interconnections semiconductor device.

BACKGROUND

There is a growing demand for high-performance semiconductor packages.However, increases in semiconductor circuit density pose interconnectchallenges for a packaged chip's thermal, mechanical and electricalintegrity. Thus, there is a need for a semiconductor package withimproved routing capabilities.

SUMMARY OF THE DISCLOSURE

Embodiments of the present invention are directed to plated terminalswith routing interconnections semiconductor device and a method ofmanufacturing thereof. A semiconductor package includes terminals, eachhaving an exposed surface that is flush with a bottom surface of thesemiconductor package, and a layer of interconnection routings disposedwithin the semiconductor package. At least one interconnection routingis electrically coupled with a terminal and extends planarly therefrom.The semiconductor package also includes at least one die coupled withthe layer of interconnection routings. In some embodiments, thesemiconductor package also includes one or more additional intermediarylayers. Each intermediary layer includes a via layer and an associatedrouting layer. The associated routing layer includes associatedroutings. At least one associated routing is electrically coupled with aterminal and extends planarly therefrom. Each via layer couples tworouting layers. The semiconductor package also includes a lockingmechanism for fastening a package compound with the interconnectionroutings and the terminals.

In one aspect, a semiconductor package includes a die, terminals,interconnection routings forming an interconnection routing layer, and apackage compound. Each terminal typically includes an exposed surfacethat is flush with a bottom surface of the semiconductor package. Theinterconnection routing layer is coupled with the die. The packagecompound includes a top molding compound encapsulating theinterconnection routings and the die, and a bottom molding compoundsurrounding the terminals. The package compound can include otherintermediary molding compounds.

In some embodiments, a shape of an interconnection routing and aterminal electrically coupled with the interconnection routing and anyadditional layers therebetween is irregular to lock with the packagecompound. In some embodiments, each layer has width dimensions differentfrom that of adjacent layers. In some embodiments, each layer is formedseparately from other layers.

The interconnection routings are electrically coupled with terminals. Insome embodiments, at least one of the interconnection routings extendsaway from a terminal coupled therewith according to a design pattern. Insome embodiments, a first of the interconnection routings is coupledwith a second of the interconnection routings.

In some embodiments, the semiconductor package also includes wire bondsor solder balls that couple the die with the interconnection routinglayer.

In some embodiments, the semiconductor package also includes at leastone other die coupled with the die, the interconnection routing layer,or both.

In some embodiments, the semiconductor package also includes solderballs coupled with the terminals. The solder balls extend away from thesemiconductor package to increase terminal package stand off.

In some embodiments, the semiconductor package also includes at leastone intermediary layer. Each of the at least one intermediary layerincludes an associated routing layer and a via layer. The associatedrouting layer includes associated routings electrically coupled with theterminals. In some embodiments, at least one associated routingelectrically extends away from a terminal coupled therewith according toanother design pattern. In some embodiments, the via layer includes viaselectrically coupled with the terminals.

In another aspect, a semiconductor package includes terminals. Eachterminal typically includes an exposed bottom surface. The semiconductorpackage also includes a primary routing layer positioned within thesemiconductor package and includes primary routings electrically coupledwith the terminals. At least one of the primary routings extendsplanarly therefrom. In some embodiments, one of the primary routings iselectrically coupled with at least another terminal. The semiconductorpackage also includes at least one die electrically coupled with theprimary routing layer.

In some embodiments, the semiconductor package also includes a lockingmechanism for fastening a package compound with the primary routings andthe terminals.

In some embodiments, the semiconductor package also includes at leastone intermediary layer coupling with the primary routing layer. In someembodiments, the at least one intermediary layer includes an associatedrouting layer having associated routings electrically coupled with theterminals. At least one of the associated routings extends planarlytherefrom. In some embodiments, a pattern formed by the associatedroutings of the associated routing layer is different from a patternformed by the primary routings of the primary routing layer. In someembodiments, the intermediary layer also includes a via layer havingvias. Each via is electrically coupled with a terminal and extendsnonplanarly therefrom.

BRIEF DESCRIPTION OF THE DRAWINGS

The novel features of the invention are set forth in the appendedclaims. However, for purpose of explanation, several embodiments of theinvention are set forth in the following figures.

FIG. 1 illustrates an exemplary method of manufacturing a semiconductorpackage in accordance with the present invention.

FIGS. 2A-2D illustrate an exemplary result produced at each step of themethod of FIG. 1.

FIGS. 3A-3B illustrate another exemplary semiconductor package and amethod of manufacturing the same in accordance with the presentinvention.

FIGS. 4A-4C illustrate yet another exemplary semiconductor package and amethod of manufacturing the same in accordance with the presentinvention.

FIG. 5 illustrates an exemplary method of manufacturing a semiconductorpackage having a complicated routing circuit in accordance with thepresent invention.

FIGS. 6A-6B illustrate exemplary results produced at selected steps ofthe method of FIG. 5.

FIG. 7 illustrates a cross-sectional view of an exemplary semiconductorpackage having three routing layers in accordance with the presentinvention.

FIG. 8 illustrates an exemplary semiconductor package having a pluralityof semiconductor dies in accordance with the present invention.

FIG. 9 illustrates an exemplary semiconductor package having increasedterminal package standoff in accordance with the present invention.

DETAILED DESCRIPTION

In the following description, numerous details are set forth forpurposes of explanation. However, one of ordinary skill in the art willrealize that the invention can be practiced without the use of thesespecific details. Thus, the present invention is not intended to belimited to the embodiments shown but is to be accorded the widest scopeconsistent with the principles and features described herein or withequivalent alternatives.

Reference will now be made in detail to implementations of the presentinvention as illustrated in the accompanying drawings. The samereference indicators will be used throughout the drawings and thefollowing detailed description to refer to the same or like parts.

Embodiments of the present invention are directed to plated terminalswith routing interconnections semiconductor device. A semiconductorpackage includes terminals, each having an exposed surface that is flushwith a bottom surface of the semiconductor package, and a layer ofinterconnection routings disposed within the semiconductor package. Atleast one interconnection routing is electrically coupled with aterminal and extends planarly therefrom. The semiconductor package alsoincludes at least one die coupled with the layer of interconnectionroutings. In some embodiments, the semiconductor package also includesone or more additional intermediary layers. Each intermediary layerincludes a via layer and an associated routing layer. The associatedrouting layer includes associated routings. At least one associatedrouting is electrically coupled with a terminal and extends planarlytherefrom. Each via layer couples two routing layers. The semiconductorpackage also includes a locking mechanism for fastening a packagecompound with the interconnection routings and the terminals.

FIG. 1 illustrates an exemplary method 100 of manufacturing asemiconductor package in accordance with the present invention. Anexemplary result produced by each step of the method 100 is illustratedin FIGS. 2A-2C. The method 100 begins at a step 105, where a sheetcarrier is provided. In some embodiments, the sheet carrier is a purecopper leadframe strip. The leadframe strip can be of other suitablematerial.

At a step 110, a plurality of terminals is formed on the sheet carrier.In some embodiments, the plurality of terminals is formed by plating aplurality of patterns with Cu, Ag, NiPdAu, or other suitable material.The plurality of patterns can be of any shape and size. As illustratedin FIG. 2A, the patterns are cylindrical and equidistantly separated.The plurality of patterns eventually becomes the plurality of terminals.

At a step 115, the sheet carrier is molded with a first moldingcompound. The first molding compound surrounds the plurality ofterminals on the sheet carrier. The height of the first molding compoundis typically the same as the height of the plurality of terminals. Thefirst molding compound includes a plastic polymer or resin.

At a step 120, electrical paths are formed for a first routing layer. Insome embodiments, the electrical paths are formed by using catalytic inkto form the electrical paths during a process, such as, a screenprinting process or an inkjet writing process. The catalytic ink isdropped on the first molding compound according to a pattern. Thecatalytic ink is dropped around the perimeter of each terminal and canextend planarly therefrom. The catalytic ink is formulated ink forinitiating copper plating on the first routing layer. An exemplarycatalytic ink is MicroCat manufactured by MacDermid Incorporated.

At a step 125, the first routing layer is plated. The plating is adheredto a portion of the first molding compound that had been initiated bythe catalytic ink. In other words, the plating is adhered to theelectrical paths. The plating is also adhered to a top surface of eachterminal. The first routing layer can be plated using an electro platingprocess or an electroless plating process. The electrical paths aretypically conductive and form routings.

In some embodiments, if the first routing layer is the topmost routinglayer, then the routings on the first routing layer are interconnectionroutings. The interconnection routings are electrically coupled with theterminals. In some embodiments, at least one interconnection routingextends planarly therefrom. In some embodiments, an interconnectionrouting is electrically coupled with at least another terminal. In someembodiments, a first interconnection routing is electrically coupledwith a second interconnection routing. This interconnection routinglayer is typically configured for coupling with dice.

At a step 130, dice are placed on the first routing layer. In someembodiments, the dice are coupled with the first routing layer viaepoxy. As illustrated, the epoxy is filled in spaces between theinterconnection routings, beneath the dice. Other adhesives can be usedto couple the dice with the first routing layer. Bond wires couple diceterminals to the interconnection routings. The bond wires can be goldwires, copper wires or any suitable metallic wires.

At a step 135, the dice are encapsulated with a second molding compound,which also encapsulates the interconnection routings and the bond wires.The second molding compound includes a plastic polymer or resin. Thesecond molding compound can be the same as or different from the firstmolding compound. The first molding compound and the second moldingcompound become part of a package compound.

At a step 140, the sheet carrier is removed. In some embodiments, thesheet carrier is removed by performing an etching process, which can bea dip process or a spray process. Once the sheet carrier is removed, theplurality of terminals is exposed at a bottom surface of the sheetcarrier. Other processes for removing the sheet carrier are possible.Typically, the molding is minimally or not affected by the removal ofthe sheet carrier. For instance, when the sheet carrier comprisescopper, and the removal step 140 involves using a chemical etchant,preferably, the etchant is selected such that the etchant is reactivewith (removes) the sheet carrier with minimal effect to the molding. Anexample of such an etchant includes cupric chloride.

At a step 145, a singulation process is performed to separatesemiconductor packages from the strip. Singulation can be done using ahigh-speed saw, a laser, a high-pressure water jet, or some othersuitable means. After the step 145, the method 100 ends. The singulatedpackages are available for additional testing, processing, shippingand/or use.

A singulated semiconductor package is illustrated in FIG. 2D, whichshows a top side view and a bottom side view of the singulatedsemiconductor package. The terminals have exposed bottom surfaces thatare substantially flush with a bottom surface of the semiconductorpackage. The terminals do not protrude from the semiconductor package.FIG. 2D also illustrates an x-rayed view of the top side of thesemiconductor package, which shows interconnection routings locatedinside the semiconductor package. A shape of an interconnection routingand a terminal electrically coupled with the interconnection routing andany additional layers therebetween (together referred to as simply“terminal”) is irregular and designed for locking with the packagecompound, which includes at least the first molding compound and thesecond molding compound.

The method 100 is described relative to bond wire type packages.However, the method 100 is also applicable for flip chip type packages.Instead of using bond wires to couple the dice with the first routinglayer at the step 130, solder balls are used to couple the dice with thefirst routing layer including the interconnection routings, asillustrated in FIG. 3A. FIG. 3B illustrates a completed, singulated flipchip package in accordance with the present invention.

FIGS. 4A-4C illustrate yet another exemplary semiconductor package and amethod of manufacturing the same in accordance with the presentinvention. FIG. 4A illustrates a base copper sheet carrier includingpackage die attach pads and terminals. Similar to the method 100 forbase sheet carrier fabrication, die attach pads and terminals are formedinstead of interconnection routing terminals for thermal dissipationpurposes. The dice are coupled with the die attach pads using anadhesive. Bond wires couple dice terminals with the interconnectionroutings. The bond wires can be gold wires, copper wires or any suitablemetallic wires.

FIG. 4B illustrates a completed, singulated semiconductor package inaccordance with the present invention. The semiconductor package in FIG.4B has terminals and a die attach pad that have exposed bottom surfaces.The exposed bottom surfaces are substantially flush with a bottomsurface of the semiconductor package. The terminals and the die attachpad do not protrude from the semiconductor package. The die attach padof the semiconductor package is configured for thermal dissipation.

FIG. 4C illustrates an x-rayed view of a bottom side of thesemiconductor package, which shows the terminals and the die attach pad.A shape of a terminal and a shape of the die attach pad are eachirregular and designed for locking with the package compound.

In some instances, a semiconductor die requires a package that has amore complicated routing circuit than that of the embodiments describedabove, since a single routing layer is insufficient. The concepts of thepresent invention can also be applied for multilayer routing packages byforming at least one intermediary layer that couples with the firstrouting layer. An intermediary layer typically includes a via layer anda subsequent routing layer. The method 100 can be extended to include,after the plating for the first routing layer step (125) and before theplacing dice on the first routing layer step (130) of FIG. 1, a processfor creating an intermediary layer. In some embodiments, the subsequentrouting layer becomes the topmost routing layer, which behaves as abondable routing layer configured to couple with the dice using, forexample, bond wires or solder balls.

FIG. 5 illustrates an exemplary method 500 of manufacturing asemiconductor package having a complicated routing circuit in accordancewith the present invention. FIG. 6A illustrates exemplary resultsproduced at selected steps of the method of FIG. 5. Discussion regardingsteps 505-525 of method 500 are omitted for clarity and brevity becausethey are similar to the steps 105-125 of method 100.

After the step 525, at a step 526, a plurality of vias is formed. Theplurality of vias is formed on a topmost routing layer by plating thetopmost routing layer. The topmost routing layer can be plated by anelectro plating process or an electroless plating process. In someembodiments, the topmost routing layer is the first routing layer. Theplurality of vias typically electrically couples with the terminals andextends nonplanarly therefrom. The plurality of vias is configured toelectrically couple two routing layers. In some embodiments, theplurality of vias is similarly sized and shaped as the plurality ofpatterns. In some embodiments, the plurality of vias is alignedvertically and/or horizontally with the plurality of patterns.Alternatively, the plurality of vias is not aligned vertically and/orhorizontally with the plurality of patterns, but instead, electricallycouples with the plurality of patterns in a staggered manner.

At a step 527, the topmost routing layer and the plurality of vias aremolded with another molding compound. The another molding compoundsurrounds the plurality of vias and the first routing layer. The heightof the second molding compound is typically the same as the combinedheight of the plurality of vias and the first routing layer. The anothermolding compound includes a plastic polymer or resin.

At a step 528, electrical paths are formed for the subsequent routinglayer. In some embodiments, the electrical paths are formed by usingcatalytic ink to form the electrical paths during a process, such as, ascreen printing process or an inkjet writing process. The catalytic inkis dropped on the subsequent molding compound according to anotherpattern. The catalytic ink is dropped around the perimeter of eachterminal and can be extended planarly therefrom. The catalytic ink isformulated ink for initiating copper plating on the subsequent routinglayer. An exemplary catalytic ink is MicroCat manufactured by MacDermidIncorporated.

At a step 529, the subsequent routing layer is plated. The plating isadhered to a portion of the second molding compound that had beeninitiated by the catalytic ink. In other words, the plating is adheredto the electrical paths. The plating is also adhered to a top surface ofeach terminal. The subsequent routing layer can be plated using anelectro plating process or an electroless plating process. Theelectrical paths are typically conductive and form routings.

In some embodiments, the routings on the subsequent routing layer areassociated routings. Each associated routing is electrically coupledwith a terminal and extends planarly therefrom. In some embodiments, anassociated routing is electrically coupled with at least anotherterminal. In some embodiments, a first associated routing iselectrically coupled with a second associated routing.

In some embodiments, if the subsequent routing layer becomes the topmostrouting layer, then the routings of the subsequent routing layer areinterconnection routings. In some embodiments, each interconnectionrouting is electrically coupled with a terminal and extends planarlytherefrom. In some embodiments, an interconnection routing iselectrically coupled with at least another terminal. In someembodiments, a first interconnection routing is electrically coupledwith a second interconnection routing. This interconnection routinglayer is typically configured for coupling with dice.

Typically, the steps 526-529 can be repeated for each additionalintermediary layer. A pattern formed by associated routings of asubsequent routing layer can be the same as or different from a patternformed by interconnection routings of a layer of interconnectionroutings. Similarly, the pattern formed by the associated routings ofthe subsequent routing layer can be the same as or different from apattern formed by interconnection routings of another subsequent routinglayer.

The method 500 continues with steps 530-545, which are omitted for thesake of clarity and brevity because they are similar to the steps130-145 of method 100. After the step 545, the method 500 ends.

FIG. 6B illustrate a singulated semiconductor package having two routinglayers in accordance with the present invention. With the moldingcompound, die, and bonds wires or solder balls removed, each platinglayer is shown in exploded view. The first plating layer includesterminals of the package. The second plating layer includes anassociated routing layer. The third plating layer includes vias thatlink routing layers. The fourth plating layer includes a bondable layeron which the die is placed for a wire bond type package or a flip chiptype package. Plating of each layer has width dimensions different fromthat of adjacent layers. The layers can have the same or differentheight dimensions. As discussed above, each layer is formed separatelyfrom other layers.

In case two routing layers are insufficient, the concept illustrated inFIGS. 6A-6B of building two routing layers (e.g., steps 526-529) can berepeated for each additional layer. FIG. 7 illustrates a cross-sectionalview of an exemplary semiconductor package having three routing layersin accordance with the present invention.

In some embodiments, in any of the aforementioned semiconductorpackages, a semiconductor package can also include at least one otherdie coupled with a die (e.g., stacked dice), at least two dice mountedon the topmost routing layer (e.g., interconnection routing layer), orboth within the semiconductor package. FIG. 8 illustrates exemplarysemiconductor packages each having a plurality of semiconductor dies inaccordance with the present invention.

In some embodiments, in any of the aforementioned semiconductorpackages, a semiconductor package can also include solder balls thatcouple with the terminals. The solder balls extend away from thesemiconductor package to thereby increase terminal package standoff.FIG. 9 illustrates an exemplary semiconductor package having increasedterminal package standoff in accordance with the present invention.

While the invention has been described with reference to numerousspecific details, one of ordinary skill in the art will recognize thatthe invention can be embodied in other specific forms without departingfrom the spirit of the invention. Thus, one of ordinary skill in the artwill understand that the invention is not to be limited by the foregoingillustrative details, but rather is to be defined by the appendedclaims.

1. A semiconductor package comprising: a. a die; b. a die attach padincluding an exposed surface that is flush with a bottom surface of thesemiconductor package; c. terminals, each terminal including an exposedsurface that is flush with the bottom surface of the semiconductorpackage; d. a package compound including: i. a top molding compoundencapsulating the die; and ii. a bottom molding compound surrounding abottom portion of each of the terminals; and e. catalytic ink on asurface of the bottom molding compound, around the bottom portion ofeach of the terminals and the die attach pad and below a top portionthereof.
 2. The semiconductor package of claim 1, wherein a shape ofeach of the terminals and the die attach pad is irregular to lock withthe package compound. 3-6. (canceled)
 7. The semiconductor package ofclaim 1, further comprising wire bonds coupling the die with nonexposedsurfaces of the terminals. 8-19. (canceled)
 20. The semiconductorpackage of claim 1, wherein the bottom portion of each of the terminalsand the die attach pad is of a plating material.
 21. The semiconductorpackage of claim 20, wherein the top portion of each of the terminalsand the die attach pad is of the plating material.
 22. The semiconductorpackage of claim 21, wherein the top portion of each of the terminalsand the die attach pad adheres to the catalytic ink and the bottomportion of each of the terminals and the die attach pad.
 23. Thesemiconductor package of claim 22, wherein edges of the top portion ofeach of the terminals and the die attach pad extend beyond edges of thebottom portion of each of the terminals and the die attach pad.
 24. Asemiconductor package comprising: a. a first molding compound; b. asecond molding compound; c. terminals, wherein each of the terminalsincludes an exposed bottom surface, a nonexposed top surface, a firstportion surrounded by the first molding compound and a second portionpositioned on the first molding compound; d. a die attach pad includingan exposed bottom surface, a nonexposed top surface, a first portionsurrounded by the first molding compound and a second portion positionedon the first molding compound; e. at least one die on the nonexposed topsurface of the die attach pad and electrically coupled with thenonexposed top surfaces of the terminals; and f. catalytic ink on thefirst molding compound, around the first portion of each of theterminals and the die attach pad and below the second portion thereof.25. The semiconductor package of claim 24, further comprising a lockingmechanism for fastening a package compound with the terminals and thedie attach pad.
 26. The semiconductor package of claim 25, wherein thepackage compound includes the first molding compound and the secondmolding compound.
 27. The semiconductor package of claim 26, wherein thecatalytic ink is configured to initiate plating of plating material. 28.The semiconductor package of claim 27, wherein the second portion ofeach of the terminals and the die attach pad is of the plating material.